高等学校化学学报 ›› 2010, Vol. 31 ›› Issue (5): 839-854.

• 综合评述 • 上一篇    下一篇

胶体刻蚀——纳米结构化表面的构筑与应用

张刚1, 赵志远1, 汪大洋2   

  1. 1. 吉林大学化学学院, 超分子结构与材料国家重点实验室, 长春 130012;
    2. Max Planck Institute of Colloids and Interfaces, Potsdam 14424, Germany
  • 收稿日期:2009-11-12 出版日期:2010-05-10 发布日期:2010-05-10
  • 通讯作者: 张刚, 男, 博士, 教授, 主要从事有序图案化结构与胶体界面组装研究. E-mail: gang@jlu.edu.cn
  • 基金资助:

    国家自然科学基金(批准号: 50703015)和国家“九七三”计划项目(批准号: 2007CB936402)资助.

Colloidal Lithography——Construction and Application of Nanostructured Surfaces

ZHANG Gang1*, ZHAO Zhi-Yuan1, WANG Da-Yang2   

  1. 1. State Key Lab of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, China;
    2. Max Planck Institute of Colloids and Interfaces, 14424 Potsdam, Germany
  • Received:2009-11-12 Online:2010-05-10 Published:2010-05-10
  • Contact: ZHANG Gang. E-mail: gang@jlu.edu.cn
  • Supported by:

    国家自然科学基金(批准号: 50703015)和国家“九七三”计划项目(批准号: 2007CB936402)资助.

摘要:

综述了近年来胶体刻蚀领域的研究进展, 分别讨论了基于胶体微粒和胶体晶体为模板的可控沉积与可控刻蚀及在固体平面基质、曲面基质和气液界面等不同基质上构筑结构化表面的方法. 同时还探讨了利用胶体刻蚀方法形成的微纳结构在光、电、磁以及表面润湿和生物学等方面的应用.

关键词: 胶体刻蚀; 胶体晶体; 可控沉积; 可控刻蚀; 图案化

Abstract:

Combining “top-down” patterning with “bottom-up” self-assembly as template colloidal lithography provides a unique patterning strategy. Spontaneous formation of well-ordered colloidal arrays provides lithographic masks or scaffolds for creating useful patterns. Based on self-assembly of colloidal spheres as template, the controlled “positive” deposition of nanoparticles and “negative” etching processes could be used for the fabrication of nanostructured materials, ranging from several tens of nanometers to micrometer scales for 2D and 3D ordered architectures. The feature size can easily shrink below 100 nm by reducing the diameter of the microspheres used according to the simple correlation between the interstice size and the sphere diameter. The feature shape can be easily diversified by the crystalline structure of a colloidal crystal mask, the time of anisotropic etching of the mask, the incidence angle of the vapor beam and the mask registry. Colloidal lithography provides a complementary tool for conventional and fully “top-down” lithographic techniques, and thus holds immense promise in surface patterning. They show versatility applications such as biosensors or chemosensors using for detection tool. Colloidal lithography is also suitable for modifying surface properties which is useful for emerging applications in biotechnology and chemically and structurally designed interactive sites for the attachment.

Key words: Colloidal lithography; Colloidal crystal; Controlled deposition; Controlled etching; Patterning