高等学校化学学报 ›› 2000, Vol. 21 ›› Issue (S1): 389.

• Chemistry in Surface Science • 上一篇    下一篇

Electrodeposition Under High Magnetic Field

YU Qing-Kai, SEIICHIRO Nakabayashi   

  1. Department of Chemistry, Faculty of Science, Saitama University, Urawa, Japan
  • 出版日期:2000-12-31 发布日期:2000-12-31

Electrodeposition Under High Magnetic Field

YU Qing-Kai, SEIICHIRO Nakabayashi   

  1. Department of Chemistry, Faculty of Science, Saitama University, Urawa, Japan
  • Online:2000-12-31 Published:2000-12-31

摘要:

The film growth under high magnetic field using a super-conducting magnet is discussed from the view point of a magnetization energy. The film configuration in nickel eletrodeposits with and without the high magnetic field was examined by means of the AFM (Atomic Force Microscopy), In the absence of magnetic field, the film surface appeared irregular structure. However, when the magnetic field was imposed in parallel to the cathode plate, nickel deposited shown clearly ordered stationary structure. The experimental results could be explained by nickel magnetic anisotropy. On the other hand, when the field was imposed in perpendicular to a cathode plate, deposition structure is controlled by the fluid motion induced by Lorentz force.

Abstract:

The film growth under high magnetic field using a super-conducting magnet is discussed from the view point of a magnetization energy. The film configuration in nickel eletrodeposits with and without the high magnetic field was examined by means of the AFM (Atomic Force Microscopy), In the absence of magnetic field, the film surface appeared irregular structure. However, when the magnetic field was imposed in parallel to the cathode plate, nickel deposited shown clearly ordered stationary structure. The experimental results could be explained by nickel magnetic anisotropy. On the other hand, when the field was imposed in perpendicular to a cathode plate, deposition structure is controlled by the fluid motion induced by Lorentz force.

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