摘要：

Hydrogen-terminated silicon surface is of technological importance to semiconductor processes such as pre-gate^[1]. Re-contamination and re-oxidation on silicon surface become more stringent issues in order to meet the requirements in the process for producing reduced size IC chips. The modification of silicon surfaces by various strategies has attracted more attention in the past few years^[2-4]. The frequently used techniques to attach functional groups to silicon surfaces are via chemical^[2], photochemical^[3] and electrochemical reactions^[4]. Various ways to attach monlayers to silicon surfaces has been reported, including alkylation of silicon with alkenes, alkyenes, aldehydes, alcohols and Grigard reagents under photoactivated or catalytic reactions. Particularly, porous silicon prepared by chemical or electrochemical treatments has been extensively studied. Preparation of passivated layers on porous silicon surfaces has disadvantages that the silicon surfaces are damaged by reactive agents during the reaction or become porous for attachment of molecules. Recently, self-assembled monolayer of alcohols on porous silicon was reported at modest heating without the aid of catalyst or photoexcitation or potential^[5]. In the paper, we report a novel method to attach highly polarized fluoroalkylsilane on atomically flat Si(111) surface at room temperature and to form a self-assembled monolayer to prevent the silicon surface from re-contamination and re-oxidation.

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