[1] Onda T.,Sh ibuich i S.,Satoh N.et al..Langm uir[J],1996,12(6);2 125—2 127
[2] Nakajim a A.,Fujish im a A.,Hash imo to K.et al..Adv.Mater.[J],1999,11(16);1 365—1 368
[3] Miw a M.,Nakajim a A.,Fujish im a A.et al..Langm uir[J],2000,16(13);5 754—5 760
[4] Tadanaga K.,Mo rinaga J.,Matsuda A.et al..Chem.Mater.[J],2000,12(3);590—592
[5] Li H.J.,Wang X.B.,Song Y.L.et al..Angew.Chem.In t.Ed.[J],2001,40(9);1 743—1 746
[6] LI Shu-Hong(李书宏),FENG Lin(冯 琳),LI Huan-Jun(李欢军)et al..Chem.J.Ch inese Univeristies(高等学校化学学报)[J],2003,24(2);340—342
[7] Pesika N.S.,Hu Z.,Stebe K.J.et al..J.Phys.Chem.B[J],2002,106(28);6 985—6 990
[8] Sun R.D.,Nakajim a A.,Fujish im a A.et al..J.Phys.Chem.B[J],2001,105(10);1 984—1 990
[9] GUO Min(郭 敏),DIAO Peng(刁 鹏),CAI Sheng-Min(蔡生民)et al..Acta Phys.2Ch im.Sin ica(物理化学学报)[J],2003,13(5);478—481
[10] GUO Min(郭 敏),DIAO Peng(刁 鹏),CAI Sheng-Min(蔡生民).Acta Chimica Sinica(化学学报)[J],2003,61(8);1 165—1
168
[11] GUO Min(郭 敏),DIAO Peng(刁 鹏),CAI Sheng-Min(蔡生民).Chem.J.Chinese Univeristies(高等学校化学学报)[J],2004,25(2);345—347
[12] Noble-Luginbuhl A.R.,Nuzzo R.G..Langm uir[J],2001,17(13);3 937—3 944
[13] Nish ino T.,Meguro M.,Nakam ae K.et al..Langm uir[J],1999,15(13);4 321—4 323
[14] Laibin is P.E.,Wh itesides G.M.,Allara D.L.et al..J.Am.Chem.Soc.[J],1991,113(19);7 152—7 167
[15] Adam son A.W.,Gast A.P..Physical Chem istry of Surfaces[M],New Yo rk;John Wiley&Son s,1997 |