Chem. J. Chinese Universities ›› 2005, Vol. 26 ›› Issue (4): 757.

• Articles • Previous Articles     Next Articles

Direct Construction of Poly-L-lysine Nanostructure by Dip-pen Nanolithography

ZHOU Hua-Lan, WEI Gang, LIU Zhi-Guo, WANG Li, SONG Yong-Hai, LI Zhuang   

  1. State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
  • Received:2004-04-07 Online:2005-04-10 Published:2005-04-10

Abstract: Dip-pen nanolithography(DPN) has been developed to pattern monolayer film of various molecules in submicrometer dimensions through the controlled movement of ink-coated atomic force microscopy(AFM) tip on a desired substrate, which makes DPN a potentially powerful tool for making the functional nanoscale devices. In this letter, using direct-write dip-pen nanolithography to generate nanoscale patterns of poly-L-lysine on mica was described. Poly-L-lysine molecules can anchor themselves to the mica surface through electrostatic interaction force, so stable poly-L-lysine patterns, such as square, line, circle and cross, could be obtained on freshly cleaved mica surface. From AFM image of the patterned poly-L-lysine nanostructures on mica, we know that poly-L-lysine was flatly bound to the mica surface. These oriented patterns of poly-L-lysine on mica can provide the prospect of building functional nanodevices and offer new options for this technique in a variety of other significant biomolecules.

Key words: Dip-pen nanolithography, Poly-L-lysine, Nanostructure

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