Chem. J. Chinese Universities ›› 2024, Vol. 45 ›› Issue (5): 20240056.doi: 10.7503/cjcu20240056

• Organic Chemistry • Previous Articles     Next Articles

Photorelease and Antioxidant Activity of Avobenzone-Ferulic Acid

ZHANG Tianlong, CHEN Guang()   

  1. College of Chemistry and Chemical Engineering,Shaanxi University of Science & Technology,Xi’an 710021,China
  • Received:2024-01-31 Online:2024-05-10 Published:2024-03-12
  • Contact: CHEN Guang E-mail:chenandguang@163.com
  • Supported by:
    the National Natural Science Foundation of China(22174090);the Natural Science Basic Research Program of Shaanxi Province, China(2022JM-089);the Shaanxi Province High-level Talent Innovation Long-term Project(Chen Guang), China and the National Foreign Experts Plan High-end Project, China(G2021041002L)

Abstract:

Ferulic acid is an effective antioxidant that is widely used in the cosmetics due to its ability to resist oxidative stress and delay skin aging. However, its photosensitivity challenges its application. In order to overcome this limitation, we developed a binary molecule composed of avobenzone(AB) and ferulic acid(FA). This design is based on the existence of photoremovable benzoyl methyl in the avobenzone to protect ferulic acid from photodamage and maintain its antioxidant activity. The results showed that FA was successfully released, and AB had an effectively photoprotective effect on FA. In vitro experiments showed that AB-FA molecules and their photolysis products had significant activity of scavenging free radical, while cell experiments confirmed their low cytotoxicity and excellent ability to reactive oxygen species(ROS) scavenging.

Key words: Avobenzone, Photoprotection, Free radical scavenging activity

CLC Number: 

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