Ta2O5在Si(100)表面原子层沉积反应机理的密度泛函研究
任杰1, 周广芬1, 郭子成1, 张卫2
Density Functional Theory Study on the Surface Reaction Mechanism of Atomic Layer Deposited Ta2O5 on Si(100) Surfaces
REN Jie1*, ZHOU Guang-Fen1, GUO Zi-Cheng1, ZHANG Wei2*
高等学校化学学报
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2009, (11): 2279
-2283
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