一种高感度深紫外正性化学增幅型抗蚀剂的制备
吴立萍, 胡凡华, 王倩倩, 王菁, 王力元
Preparation of a Kind of Positive Chemically Amplified Deep UV Photoresist Material with High Sensitivity
WU Liping, HU Fanhua, WANG Qianqian, WANG Jing, WANG Liyuan
高等学校化学学报
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2017, (5): 896
-901
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DOI: 10.7503/cjcu20160804
