摘要：

Surface patterning with microscopically defined structures is a rapidly developing topic, although it is still a challenge for generating patterned surface in the size range of nanometer. Molecular assemblies normally in the size range of 1 to 102 nm should overcome easily the conventional lithographic limit. Although many techniques have been developed to generate patterned surface, surface patterning totally directed by molecular self-assembly has been less addressed. For this purpose, ways of molecular self-assembly to generate regular arrays of nanostructures have been demonstrated in our laboratory including chemisorption of dendron-thiols,surface adsorption of bolaform amphiphiles, and nano-phase separation of rod-coil diblock molecules. As to be discussed, molecular self-assembly is an alternative but effective way to produce patterned structures, particularly in the range of a few nanometers.

TrendMD: