Preparation and Characterization of Patterned TiO2 Microstructures on Silicon Surface

Chem. J. Chinese Universities ›› 2005, Vol. 26 ›› Issue (4): 599.

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Preparation and Characterization of Patterned TiO₂ Microstructures on Silicon Surface

GUAN Fei, CHEN Miao, ZHANG Rui, LIANG Shan, XUE Qun-Ji

State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China

Received:2004-08-31 Online:2005-04-10 Published:2005-04-10

Abstract

Abstract: Micro-patterned TiO₂ films on Si wafers was fabricated by selective deposition and microcontact printing technique. X-ray photoelectron spectroscopy(XPS), scanning electron microscope(SEM) and atomic force microscopy(AFM) were used to examine the properties and microstructure of the patterned TiO₂ films. This patterned TiO₂ microstructures may be widely used in the field of photonics, optics, sensing and microelectromechanical system(MEMS).

Key words: Micro-patterns, Microcontact printing, TiO₂ microstructures

CLC Number:

TB43
O69

TrendMD:

GUAN Fei, CHEN Miao, ZHANG Rui, LIANG Shan, XUE Qun-Ji. Preparation and Characterization of Patterned TiO₂ Microstructures on Silicon Surface[J]. Chem. J. Chinese Universities, 2005, 26(4): 599.

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Preparation and Characterization of Patterned TiO₂ Microstructures on Silicon Surface

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[1]	ZHANG Rui, CHEN Miao, XUE Qun-Ji, GUAN Fei, LIANG Shan . Direct Preparation of Patterned TiO₂ Film with a Microstructure by Microcontact Printing Method [J]. Chem. J. Chinese Universities, 2005, 26(5): 939.
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