Self-aligned Submonolayer Cobalt Silicide Formation Studied by Variable Temperature Scanning Tunneling Microscopy in UHV System
YE J. H.1, BAO G. W.2, WANG Yi1,2, Pan J. S.1, LI S. F. Y.2
1. Institute of Materials Research and Engineering, 3 Research Link 3, Singapore 117602, Republic of Singapore;
2. Department of Chemistry, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260 Republic of Singapore
Online:2000-12-31
Published:2000-12-31
Contact:
YE J. H.
E-mail:jh-ye@imre.org.sg
Supported by:
The authors are grateful to the National Science and Technology Board (NSTB) of Singapore for the financial support (NSTB/172/2/1-12).
YE J. H., BAO G. W., WANG Yi, Pan J. S., LI S. F. Y.. Self-aligned Submonolayer Cobalt Silicide Formation Studied by Variable Temperature Scanning Tunneling Microscopy in UHV System[J]. Chem. J. Chinese Universities, 2000, 21(S1): 222.