Surface Structures of APS Cationized Si Substrate and Monolayered Polymer Molecular Deposition Film Observed by Atomic Force Microscopy

Chem. J. Chinese Universities ›› 1994, Vol. 15 ›› Issue (11): 1702.

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Surface Structures of APS Cationized Si Substrate and Monolayered Polymer Molecular Deposition Film Observed by Atomic Force Microscopy

ZHANG Xi, GAO Mang-Lai, WANG Li-Yan, SHEN Jia-Cong

Department of Chemistry, Jilin University, Changchun, 130023

Received:1994-07-05 Revised:1994-09-03 Online:1994-11-24 Published:1994-11-24

Abstract

Abstract: The surface structure of aminopropyhlanized(APS)cationized Si substrate and monolayered polymer molecular deposition(MD) film were investigated with atomic force microscopy(AFM).AFMimages of the APS Si substrate showed a close packed and well-ordered arrangement, in which the periodical spacings are 0.359 nm and 0.562 nm in two directions, respectively.As shown in the AFMimage of polymer MDfilm, the surface fluctuation is in the range of nanometer scale and its image has no change after scanning 50-100times, thus it is demonstrated that MDfilm is of higher stablity than that of LBfilms.

Key words: AFM, APS modified surface, Molecular deposition film

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ZHANG Xi, GAO Mang-Lai, WANG Li-Yan, SHEN Jia-Cong. Surface Structures of APS Cationized Si Substrate and Monolayered Polymer Molecular Deposition Film Observed by Atomic Force Microscopy[J]. Chem. J. Chinese Universities, 1994, 15(11): 1702.

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Surface Structures of APS Cationized Si Substrate and Monolayered Polymer Molecular Deposition Film Observed by Atomic Force Microscopy

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