Design and Preparation of Non-quarter-wave SiO2/TiO2 Double-layer Antireflective Coating†

doi:10.7503/cjcu20170719

Abstract

Abstract:

Non-quarter-wave double-layer antireflective(AR) coatings were designed with the aid of TFCalc thin film design software. Compared with quarter-wave double-layer AR coatings, non-quarter-wave double-layer AR coatings have a wider selection for film materials since the refractive index of the bottom-layer(n₁) and upper-layer(n₂) just need to satisfy the relation n₁≥n₂(n_s/n₀)^1/2(n_s and n₀ are the refractive index of substrate and air, respectively). And in the practical experiment, TiO₂ and SiO₂ sol were separately prepared by sol-gel method under acid-catalyzed condition and then consecutively deposited on K9 glass by dip-coating process to finally fabricate the mainly designed non-quarter-wave double-layer AR coating. It was found that the maximum transmittance at the reference wavelength reached 99.9%, and the measured transmittance spectrum was in accordance with the designed one from TFCalc. Futhermore, the transmittance did almost not decrease after abrasion and adhesion tests, indicating an excellent mechanical property of this SiO₂/TiO₂ AR coating. The high transmittance and excellent mechanical property give this non-quarter-wave double-layer SiO₂/TiO₂ AR coating a great potential in the field of solar cells.

Key words: Thin film design, Non-quarter-wave, Double-layer coating, High transmittance, Mechanical robust

CLC Number:

O613

TrendMD:

YE Longqiang, GE Xinming, ZHANG Yulu, HUI Zhenzhen, WANG Xuchun, JIANG Bo. Design and Preparation of Non-quarter-wave SiO₂/TiO₂Double-layer Antireflective Coating^†[J]. Chem. J. Chinese Universities, 2018, 39(7): 1392.

Figures/Tables 9

Fig.1 Simulated transmission spectra of non-quarter-wave SiO2/TiO2 double-layer antireflective coating^(A) a. n1=1.77, d1=77.7 nm; b. n1=1.91, d1=72.0 nm; c. n1=1.91, d1=60.0 nm; d. n1=1.91, d1=50.0 nm;e. n1=1.91, d1=40.0 nm; f. n1=1.91, d1=30.0 nm. (B) a. n1=1.91, d1=30.0 nm; b. n1=1.91, d1=20.0 nm;c. n1=1.91, d1=10.0 nm; d. n1=1.91, d1=5.0 nm; e. n1=1.91, d1=0.

Fig.2 Simulated transmission spectra of SiO2/TiO2 double-layer antireflective coating with 100% maximum transmittance(A) and the effect of outer layer film thickness on the transmittance of SiO2/TiO2 double-layer coating(B)^(A) a. d1=24.0 nm, d2=76.0 nm; b. d1=27.0 nm, d2=85.5 nm; c. d1=30.0 nm, d2=95.5 nm; d. d1=33.0 nm, d2=104.5 nm; e. d1=36.0 nm, d2=114.0 nm; f. d1=42.0 nm, d2=133.3 nm; g. d1=48.0 nm, d2=152.0 nm. (B) a. d2=69.0 nm; b. d2=84.0 nm; c. d2=99.0 nm; d. d2=114.0 nm; e. d2=129.0 nm; f. d2=144.0 nm; g. d2=159.0 nm; h. d2=174.0 nm.

Fig.3 Simulated transmission spectra of non-quarter-wave double-layer antireflective coating with common optical film as inner layer and SiO2 film as outer layer(A) and the needed inner and outer layer film’s thicknesses to achieve 100% transmittance at 550 nm(B)^(B) Inner layer: a. Al2O3; b. Si3N4; c. Ta2O5; d. Anatase-TiO2; e. Rutile-TiO2.

Fig.4 Change in thickness of SiO2 and TiO2 film as a function of withdraw rate in dip-coating process

Fig.5 Experimental(A) and simulated(B) transmission spectra of non-quarter-wave SiO2/TiO2 double-layer coating with fixed thickness of inner layer film 36.0 nm and different thickness of outer layer film^Central wavelength and transmittance: (A) a. 395 nm, 96.0%; b. 460 nm, 98.9%; c. 497 nm, 99.5%; d. 554 nm, 99.9%; e. 591 nm, 99.8%; f. 650 nm, 99.6%; g. 692 nm, 99.4%. (B) a. 395 nm, 95.5%; b. 460 nm, 99.0%; c. 497 nm, 99.7%; d. 554 nm, 100.0%; e. 591 nm, 99.9%; f. 650 nm, 99.6%; g. 692 nm, 99.4%. Thickness of outer layer: a. 76.4 nm; b. 93.6 nm; c. 101.2 nm; d. 114.0 nm; e. 126.0 nm; f. 141.3 nm; g. 151.8 nm.

Fig.6 Dispersion curves of TiO2(a) and SiO2(b) film

Fig.7 AFM patterns of SiO2(A), TiO2(B) and SiO2/TiO2(C) coating

Fig.8 Surface(A) and cross-sectional(B) SEM images of the SiO2/TiO2 double-layer coating

Fig.9 Change in transmittance of SiO2/TiO2 double-layer antireflective coating before and after abrasion and adhesion test

References 27

[1]	Ding R. M., Cui X. M., Zhang C., Zhang C., Xu Y., J. Mater. Chem. C, 2015, 3(13), 3219—3224
[2]	Cui X. M., Ding R. M., Wang M. C., Zhang C., Zhang C., Zhang J., Xu Y., Adv. Opt. Mater., 2016, 4(5), 722—730
[3]	Zhang H. J., Hu X. Y., Sun Y. Y., Zheng Y. M., Yan L. H., Jiang B., Zhang X. X., RSC Adv., 2016, 6(38), 31769—31774
[4]	Xing Z., Tay S. W., Ng Y. H., Hong L., ACS Appl. Mater. Interfaces, 2017, 9(17), 15103—15113
[5]	He M. Y., Luo J. H., Yang B. W., Xia B. B., Li Y. Y., Zhang S. M., Jiang B., Chem. J. Chinese Universities, 2017, 38(11), 2077—2081
	(何玫莹,罗健辉,杨博文, 夏碧波,李远洋,张书铭,江波.高等学校化学学报, 2017, 38(11), 2077—2081)
[6]	Yao Y., Lee K. T., Sheng X., Batara N. A., Hong N., He J., Hussain M. M., Atwater H. A., Lewis N. S., Nuzzo R. G., Rogers J. A., Adv. Energy Mater., 2017, 7(7), 1601992—1602001
[7]	Zhang X. X., Lin W., Zheng J., Sun Y., Xia B., Yan L., Jiang B., J. Phys. Chem. C, 2018, 122, 596—603
[8]	Moghal J., Kobler J., Sauer J., Best J., Gardener M., Watt A. A., Wakefield G., ACS Appl. Mater. Interfaces, 2012, 4(2), 854—859
[9]	Guldin S., Kohn P., Stefik M., Song J., Divitini G., Ecarla F., Ducati C., Wiesner U., Steiner U., Nano Lett., 2013, 13(11), 5329—5335
[10]	Thomas I. M., Appl.Opt., 1986, 25(9), 1481—1483
[11]	Zhang X. X., Xia B. B., Ding B., Zhang Y. L., Luo J. H., Jiang B., Mater. Lett., 2013, 104, 31—33
[12]	Zou L., Li X., Zhang Q., Shen J., Langmuir, 2014, 30(34), 10481—10486
[13]	Ye H. P., Zhang X. X., Zhang Y. L., Ye L. Q., Xiao B., Lv H. B., Jiang B., Sol. Energy Mater. Solar Cells, 2011, 95(8), 2347—2351
[14]	Wongcharee K., Brungs M., Chaplin R., Hong Y., Pillar R., Sizgek E., J. Sol-Gel Sci. Technol., 2002, 25(3), 215—221
[15]	Xia B., Zhang Q., Yao S., Zhang Y., Xiao B., Jiang B., J. Sol-Gel Sci. Technol., 2014, 71, 291—296
[16]	Ye L. Q., Zhang S. M., Wang Q., Yan L. H., Lv H. B., Jiang B., RSC Adv., 2014, 4, 35818—35822
[17]	Chi F., Yan L., Lv H., Jiang B., Mater. Lett., 2011, 65(7), 1095—1097
[18]	Zhang X. X., Cai S., You D., Yan L. H., Lv H. B., Yuan X. D., Jiang B., Adv. Function Mater., 2013, 23(35), 4361—4365
[19]	Khan S. B., Wu H., Ma L., Hou M., Zhang Z., Adv. Mater. Interfaces, 2017, 4(6), 160089—1600901
[20]	Zhang J., Wang J., Yang C. M., Jia H. B., Cui X. M., Zhao S. C., Xu Y., Sol. Energy Mater. Solar Cells, 2017, 162, 134—141
[21]	Bao L., Ji Z., Wang H., Chen R., Langmuir, 2017, 33(25), 6240—6247
[22]	Ye L. Q., Zhang X. X., Xiao B., Ye H. P., Jiang B., Chem. J. Chinese Universities, 2012, 33(5), 897—901
	(叶龙强,张欣向,肖波,业海平,江波.高等学校化学学报, 2012, 33(5), 897—901)
[23]	Hu T., Ye L. Q., Li W., Luo J., Jiang B., Chinese J. Inorg. Chem., 2014, 30(8), 1778—1782
	(胡腾,叶龙强,李文玲,罗健辉,江波.无机化学学报,2014, 30(8), 1778—1782)
[24]	Cox J. T., Hass G., Rowntree R. F., Vacuum, 1954, 4(4), 445—455
[25]	Macleod H.A.,Thin-film Optical Filters, 4nd Ed., CRC Press, New York, 2001, 129—139
[26]	Li Y. Y., Yang K., Xia B. B., Yang B. B., Yan L. H., He M. Y., Yan H. W., Jiang B., RSC Adv., 2017, 7(24), 14660—14668
[27]	Ye L. Q., Zhang Y. Y., Zhang X. X., Hu T., Ji R., Ding B., Jiang B., Energy Mater. Solar Cells, 2013, 111, 160—164

Design and Preparation of Non-quarter-wave SiO₂/TiO₂Double-layer Antireflective Coating^†

RichHTML

PDF (PC)

Knowledge

Abstract

Cite this article

share this article

Figures/Tables 9

References 27

Related Articles 2

Recommended Articles

Metrics

Comments

[1]	YE Longqiang,KANG Shuo,ZHANG Weihao,ZHANG Yulu,HUI Zhenzhen,JIANG Bo. Sol-gel Preparation of Anti-Fogging SiO₂/SiO₂-TiO₂ Double-layer Antireflective Coating ^† [J]. Chem. J. Chinese Universities, 2019, 40(11): 2274.
[2]	YE Long-Qiang, ZHANG Xin-Xiang, XIAO Bo, YE Hai-Ping, JIANG Bo. Design and Preparation of SiO₂/SiO₂-TiO₂ Antireflective Coating with Excellent Environmental Resistance [J]. Chem. J. Chinese Universities, 2012, 33(05): 897.