Fabrication of Patterned Polymer Membrane Through Replica Molding Technology Templated by Ordered Array from Continuous Meniscus†

doi:10.7503/cjcu20150545

Abstract

Abstract:

Replica molding technology has a reproducible and high-resolution advantage in fabrication of polymer patterns with the feature sizes of sub-micrometer to micrometer. It is critically desirable to develop a low cost and rapid route for building the initialtemplate. In this report, ordered array which could achieve morphological control was continuously supplied from solvent evaporation-driven process in a micron spacing gap by the coffee-stain theory. We use the patterned array as a mother setof the pattern definition of the soft moldpolydimethylsiloxane(PDMS) and obtain transferred patterns through replica molding technology. We also explore the polymer deposition periodically based on the theoretical model of Young-Laplace equation. The results demonstrate that the deposition frequency is influened by molecular weight of polymer, sliding speed of glass plate and concentration of solution. Trends predicted by these calculations agree with experimental behavior.

Key words: Meniscus, Ordered array, Initial template, Replica molding technology, Patterned polymer membrane

CLC Number:

O631

TrendMD:

JIA Ruokun, YANG Xiaohang, LONG Zhiyun, HE Leiyin, WANG Panxin, ZHANG Lingyun, ZHAO Ming. Fabrication of Patterned Polymer Membrane Through Replica Molding Technology Templated by Ordered Array from Continuous Meniscus^†[J]. Chem. J. Chinese Universities, 2016, 37(2): 388.

Figures/Tables 9

Fig.1 Experimental set-up for the polymer solutions in a micron spacing gap

Fig.2 SEM images of dot(A) and stripe(B) PS patterns

Fig.3 SEM images of PS stripe patterns (A) Low sliding speed(20 μm/s); (B) high sliding speed(50 μm/s).

Fig.4 SEM images of PDDT dot paterns (A) Low-magnification; (B) high-magnification.

Fig.5 SEM images of PDDT stripe paterns (A, B) PDDT of chloroform solution(0.1 g/L); (C, D) PDDT of chloroform solution(0.5 g/L); (A, C) Low-magnification; (B, D) high-magnification.

Fig.6 SEM images of PDMS negative mold (A) Shrunken pattern(without press); (B) stripe pattern(with press).

Fig.7 SEM images of PB initial(A) and shrunken(B) patterns

Fig.8 Process of evaporation-driven polymer deposition by the coffee-stain theory

Fig.9 Theoretical model of solvent evaporation-driven polymer deposition

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