Abstract: The inverted pyramidal microstructures were fabricated by anisotropic wet etching on the domain structure patterned Si substrate, which was obtained by transferring stearic acid monolayer onto Si substrate via Langmuir-Blodgett(LB) technique. The height of inverted pyramidal structures and the antireflective properties were mainly dependent on etching duration. This method combines the simplicity and scalability of self-assembly and low cost of chemical etching. It is an inexpensive and effective method to fabricate antireflective surface over large area, which has potential applications on reducing the cost of optical devices and solar cells.

Key words: LB monolayer, Inverted pyramidal microstructure, Single crystal silicon, Antireflection