PMMA人工晶状体表面的CF<sub>4</sub>/O<sub>2</sub>等离子体修饰

ZHANG Li-Hua¹, WU Di¹, CHEN Ya-Shao^1*, LI Xue-Jiao¹, ZHAO Bao-Ming¹, HUANG Chang-Zheng²

Chem. J. Chinese Universities . 2008, (9): 1854 -1858 .