Chem. J. Chinese Universities ›› 1981, Vol. 2 ›› Issue (3): 285.

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A STUDY OF MECHANISM OF ZINC DEPOSITION IN Zn2+-HEDP-CO32- SYSTEM OF ELECTROPLATING-Ⅰ-COMPOSITION OF THE MIXED COMPLEX AND ACTION OF CO32-

Fang Jingli1, Ma Sinmao2, Lu Weizhen2   

  1. Coordination Chemistry Research Institute, Nanjing University, Nanjing
  • Received:1980-08-05 Online:1981-08-24 Published:1981-08-24

Abstract: 1-Hydroxyethylidenediphosphonic acid (HEDP, HSL) has been used in zinc plating, but no information of its mechanism of deposition has been reported. The composition of the mixed complex in plating solution was determined by chemical analysis,IR spectra and conductometric titration.The results showed that the composition corresponded to K6[Zn(HL) (CO3)2].Effects of the second ligand CO32-on electrochemical behavior of plating solution has been investigated. The results indicate that the CO32-has an important action on stability of the plating solution, dissolution of anode, polarization of cathode and throwing and covering power of solution.Effect of the form of mixed complexes on electrodeposition has been discussed. Restriction of application in determining electrodeposited complex ion on cathode by method of exchange current density has also been discussed.

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